Scanning electron microscopy image of Escherichia coli exposed with atmospheric-pressure plasma jet

Abstract

The morphological change of Escherichia coli (E. coli) exposed to an atmospheric-pressure argon (Ar) plasma jet was observed by scanning electron microscopy (SEM). The Ar plasma jet was generated at a frequency of 9 kHz, applied voltage of 10 kV, and Ar gas flow rate of 10 L/min at atmospheric pressure. E. coli seeded on an agar plate in a Petri dish was disinfected by Ar plasma jet exposure for 2 seconds. SEM images showed that E. coli cells deformed and faded after the Ar plasma jet exposure. The morphological changes were probably due to the destruction of the cell wall and cell membrane of E. coli caused by the collision of Ar ions and/or electrons in the Ar plasma jet. © 2010 The Surface Science Society of Japan.