Two‐Layer Formation of Passivating Films on Cobalt in Neutral Solution

  • Ohtsuka T
  • Sato N
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Abstract

Layer structure and thickness of passivation oxide films on cobalt have been investigated at stationary and transient states in solution of 0.30 mol dm -3 boric acid-0.075 mol dm -3 sodium borate mixture of pH 8.4 by means of chemical analysis and in situ ellipsometry combined with electrochemical measurements. A two-layer structure composed of an inner CoO and an outer CO 3-Δ O 4 is found in a potential range more positive than 0.75V (vs. the hydrogen electrode at the same solution). The nonstoichiometry changes from Δ = 0 to 0.33 with increasing anodic potential. The outer CO 3-Δ O 4 layer thickness increases linearly with potential, whereas the inner layer thickness is not a simple function of potential, but depends on the film formation procedure. A step-wise potential increase gives an initial rapid growth of the outer CO 3-Δ O 4 layer followed by a gradual thickening of the inner CoO layer. The transient film growth behavior is interpreted in terms of a field-assisted ion diffusion mechanism, and the self-diffusion coefficient in the inner CoO layer is estimated to be D/cm sec -1 = 6.5 x 10 -21 ~ 2.6 x 10 -20. . © 1981, The Electrochemical Society, Inc. All rights reserved.

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Ohtsuka, T., & Sato, N. (1981). Two‐Layer Formation of Passivating Films on Cobalt in Neutral Solution. Journal of The Electrochemical Society, 128(12), 2522–2528. https://doi.org/10.1149/1.2127284

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