Underpotential deposition of copper on electrochemically treated polycrystalline Au surfaces

3Citations
Citations of this article
11Readers
Mendeley users who have this article in their library.
Get full text

Abstract

Cyclic voltammetric responses of electrochemically treated polycrystalline gold surfaces have been examined using Cu-UPD probe reactions (UPD-underpotential deposition). The treatment procedure used appears to induce preferential crystal orientation of the Au surface with a very small roughness factor and affords a simple method to obtain well-defined surfaces for electrochemical studies. © 1991 Indian Academy of Sciences.

Cite

CITATION STYLE

APA

Phani, K. L. N., Mohan, S., & Venkatachalam, R. (1991). Underpotential deposition of copper on electrochemically treated polycrystalline Au surfaces. Proceedings of the Indian Academy of Sciences - Chemical Sciences, 103(5), 677–683. https://doi.org/10.1007/BF02841069

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free