Nanosphere Lithography for Nitride Semiconductors

Abstract

Nanolithography has been widely studied in recent years, considering its wide-ranging applications in electronics and photonics. In the ideal case, lithography using short- wavelength electromagnetic wave through a pre-defined mask is probably the most desirable solution. However, as technology progresses further, traditional photolithography is becoming exceedingly complex and incurring higher cost associated with light source as the wavelength of light goes shorter. Therefore, other nanolithography methods become strong competitors excelling with lower equipment cost and simpler fabrication procedures. In particular, nanosphere lithography as a self-assembly bottom-up approach for producing periodic array of spherical particles is simple and inexpensive as compared to other lithographic methods.