Fabrication of highly spin-polarized Co2FeAl 0.5Si0.5 thin-films

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Abstract

Ferromagnetic Heusler Co2FeAl0.5Si0.5 epitaxial thin-films have been fabricated in the L21 structure with saturation magnetizations over 1200 emu/cm3. Andreev reflection measurements show that the spin polarization is as high as 80% in samples sputtered on unheated MgO (100) substrates and annealed at high temperatures. However, the spin polarization is considerably smaller in samples deposited on heated substrates. © 2014 Author(s).

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Vahidi, M., Gifford, J. A., Zhang, S. K., Krishnamurthy, S., Yu, Z. G., Yu, L., … Newman, N. (2014). Fabrication of highly spin-polarized Co2FeAl 0.5Si0.5 thin-films. APL Materials, 2(4). https://doi.org/10.1063/1.4869798

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