Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond

Chou, S.-Y., Shin, J.-J., Shu, K.-C., You, J.-W., Shiu, L.-H., Chang, B.-C., … Lin, B. J. (2004). Study of mask corner rounding effects on lithographic patterning for 90-nm technology node and beyond. In Photomask and Next-Generation Lithography Mask Technology XI (Vol. 5446, p. 508). SPIE. https://doi.org/10.1117/12.557745