Structural degradation and optical property of nanocrystalline ZnO films grown on Si (100)

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Abstract

Structural degradation of nanocrystalline ZnO films was observed with an increase in films thickness. Nanocrystalline epitaxial thin film with thickness of ∼170 nm changed to polycrystalline ∼900 nm with an increase in deposition time. Surface morphology revealed an average grain size of 30-50 nm. Spatial correlation model indicated structural disorder due to relative disorientation of crystalline phases at nanoscale. The photoluminescence spectra showed free exciton (FX) ∼3.31 eV, donor bound-exciton (Do X) ∼3.26 and donor-acceptor-pair (DAP) ∼3.22 eV for thin films, which redshift, i.e., FX ∼3.30, Do X ∼3.24 eV, and DAP ∼3.19-3.17 eV for thicker films (400-900 nm). © 2008 American Institute of Physics.

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Yang, B., Kumar, A., Feng, P., & Katiyar, R. S. (2008). Structural degradation and optical property of nanocrystalline ZnO films grown on Si (100). Applied Physics Letters, 92(23). https://doi.org/10.1063/1.2943656

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