Silica nanomachining using laser plasma soft x rays

Abstract

In order to demonstrate silica nanomachining, the authors fabricated line-and-space contact masks with spaces of 53 and 70 nm on silica glass plates, followed by irradiation with laser plasma soft x rays (LPSXs) with wavelengths around 10 nm. Trenches with the narrowest width of 54 nm and an aspect ratio of ∼1 were fabricated by the LPSX irradiation through the contact masks. It was also clarified that silica glass can be machined by irradiation with LPSXs in the wavelength range of 6-30 nm in Ar gas which was used as an x-ray bandpass filter. © 2006 American Institute of Physics.