Colloidal Spray Deposition Technique for the Processing of Thin Film Solid Oxide Fuel Cells

Abstract

An improved version of the colloidal deposition technique is described. Using an ultrasonic atomizer to gently lay down the colloidal soln. on a heated substrate, high quality thin films of various materials were prepd. Dense yttria-stabilized-zirconia (YSZ) films of thickness ranging from 1 to 100 μm were successfully deposited on NiO/YSZ substrates as well as on porous La0.85Sr0.15MnO3 substrates. The technique was also used to deposit a bi-layer thin film of YSZ and Ce0.8Y0.2O2 with a graded interface. [on SciFinder(R)]