Refinement and application of X-ray diffraction method as the surface roughness analysis

Abstract

We had developed the method for measurement of surface roughness using X-ray diffractometer. This method uses the X-ray diffraction (XRD) profiles from the "surface-replicated film" instead of that from the sample itself, which is vaccum-metallized thin metal film on the surface of a sample to replicate surface roughness. Several peaks separated from this profile are calculated exactly to obtain diffraction angle 2θ, intensity I, integrated intensity S, full width at half maximum intensity w (F.W.H.M.), and some other parameters. Decentering distance x as the height of convexity (x > 0) or as the deepness of concavity (x < 0) is calculated by the deviation of diffraction angle Δ2θ, and area of "rough" surface is calculated by the integrated intensity. Analytical result of the distance and area is described by these analyzed parameters like an irregular stairway. We studied for measurement to fix particularly appropriate conditions. Consequently, we designated these conditions to measrue surface roughness as follows: surface-replicated film is Au (gold), target is Cu (copper), divergence slit and scattering slit are 1° (X-ray exposed area: 16.2 mm x 10.0 mm), receiving slit is 0.3 mm. Then, we measured of electrode-posited hydroxyapatite samples using these compiled conditions. Analytical result of these samples was lead statistically and we were able to find rough surface of electrodeposited cathodes, particle size of deposited hydroxyapatite crystal on the cathodes, and convex area of electrode-posited samples by these data. Though the SEM micrograph gives figures and sizes of samples, it transcribes a fraction of the sample in a vacuum showed narrow than our X-ray diffraction method in air. If you know the surface of samples by SEM as wide as by our method, you will spend over twenty hours for only one or a few of sample. But we can need only 60-120 minutes for measurement of one sample.