A pressure-induced topological phase with large Berry curvature in Pb1-xSnxTe

72Citations
Citations of this article
85Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

The picture of how a gap closes in a semiconductor has been radically transformed by topological concepts. Instead of the gap closing and immediately reopening, topological arguments predict that, in the absence of inversion symmetry, a metallic phase protected by Weyl nodes persists over a finite interval of the tuning parameter (for example, pressure P). The gap reappears when the Weyl nodes mutually annihilate. We report evidence that Pb1-xSnxTe exhibits this topological metallic phase. Using pressure to tune the gap, we have tracked the nucleation of a Fermi surface droplet that rapidly grows in volume with P. In the metallic state, we observe a large Berry curvature, which dominates the Hall effect. Moreover, a giant negative magnetoresistance is observed in the insulating side of phase boundaries, in accord with ab initio calculations. The results confirm the existence of a topological metallic phase over a finite pressure interval.

Cite

CITATION STYLE

APA

Liang, T., Kushwaha, S., Kim, J., Gibson, Q., Lin, J., Kioussis, N., … Ong, N. P. (2017). A pressure-induced topological phase with large Berry curvature in Pb1-xSnxTe. Science Advances, 3(5). https://doi.org/10.1126/sciadv.1602510

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free