Abstract
We have addressed the existing ambiguity regarding the effect of tensile strain in the underlying GaN layer on AlxGa1-xN/GaN heterostructure properties. The bandgaps and band-offsets for AlxGa1-xN on strained GaN were first computed using density functional theory (DFT), in the generalized gradient approximations (GGA) and hybrid functional Gaussian-Perdew-Burke-Ernzerhof (Gau-PBE) regimes. We propose a simple model to relate the GGA and Gau-PBE bandgaps, which is used to determine the realistic bandgaps of strained AlGaN. The bandgaps and band-offsets from the DFT calculations are then used to analytically calculate the two-dimensional electron gas density in an AlxGa1-xN/GaN hetero-interface. Our bandstructure calculations show that it is not possible to induce significant change in band-offsets through strain in the GaN layer. The charge-density calculations indicate that such strain can, however, modulate the polarization charge and thereby enhance the 2DEG density at the AlGaN/GaN interface substantially.
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CITATION STYLE
Date, M., Mukherjee, S., Ghosh, J., Saha, D., Ganguly, S., Laha, A., & Ghosh, P. (2019). Efficient ab initio plus analytic calculation of the effect of GaN layer tensile strain in AlGaN/GaN heterostructures. Japanese Journal of Applied Physics, 58(9). https://doi.org/10.7567/1347-4065/ab39d0
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