Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification, and Synthesis

J. J. Cuomo; S. M. Rossnagel; H. R. Haufman; Ranga Komanduri

Journal ArticleOPEN ACCESS

Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification, and Synthesis

Cuomo J
Rossnagel S
Haufman H
et al.

Journal of Engineering Materials and Technology (1990) 112(2) 253-253

DOI: 10.1115/1.2903317

N/ACitations

92Readers

Abstract

Deals with ion beam processing for basic sputter etching of samples, sputter deposition of thin films, the synthesis of material in thin film form, and the modification of the properties of thin films.

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CITATION STYLE

APA

Cuomo, J. J., Rossnagel, S. M., Haufman, H. R., & Komanduri, R. (1990). Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification, and Synthesis. Journal of Engineering Materials and Technology, 112(2), 253–253. https://doi.org/10.1115/1.2903317

Handbook of Ion Beam Processing Technology: Principles, Deposition, Film Modification, and Synthesis

Abstract

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