Abstract
The report that during the formations of the isomorphous CoSi2 and NiSi2 the dominant diffusing species are different is questioned. Not only does this contradict previous results obtained with inert gas markers, but it is based on experiments carried out with Ta markers that are not inert. The problem of using markers in determining the dominant diffusing species during thin film reactions is briefly analyzed. © 2000 American Institute of Physics.
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CITATION STYLE
D’Heurle, F. M., & Zhang, S. L. (2000). Comment on “Dominant diffusing species during cobalt suicide formation” [J. Appl. Phys. 79, 153 (1996)]. Journal of Applied Physics, 87(11), 8216–8217. https://doi.org/10.1063/1.373526
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