Abstract
A new CMOS-process-compatible programmable contact antifuse (PCAF) cell is presented in this letter for advance programmable logic applications. This innovative PCAF cell adapts an oxide layer formed by the etched resist-protection oxide layer under a properly designed contact region, which results in a highly scalable one-time-programmable solution for advance logic circuits. A subcircuit model describing the I-V characteristics of the antifuse cell before and after program is developed to facilitate the future PCAF memory macro design. © 2008 IEEE.
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Chen, M., Huang, C. E., Tseng, Y. H., King, Y. C., & Lin, C. J. (2008). A new antifuse cell with programmable contact for advance CMOS logic circuits. IEEE Electron Device Letters, 29(5), 522–524. https://doi.org/10.1109/LED.2008.920754
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