In situ growth of superconducting YBa2Cu3O 7-x thin films by a hot-wall sputtering process

Abstract

YBa2Cu3O7-x (YBCO) superconducting thin films with Tc of 89 K and Jc of 2.7×106 A/cm2 at 77 K, zero field were prepared by a modified high pressure (1.5 Torr) dc planar diode sputtering process. The design and construction of the simple, economic hot-wall sputtering system which has been achieved in growing high-quality YBCO films on (001)MgO, (001)LaAlO3, and (001)YSZ substrates are reported.