Stabilization of the ceria ι-phase (Ce7O12) surface on Si(111)

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Abstract

In this work a 250 nm CeO2(111) film grown on a hex-Pr 2O3(0001)/Si(111) system is annealed at 660 °C for 30 min to form the ι bulk phase of Ce7O12 as controlled by x-ray photoelectron spectroscopy. The (111) surface of the stabilized ι phase is characterized via high-resolution low-energy electron diffraction. The ι-phase surface exhibits a (√7 × √7)R19.1° superstructure with two mirror domains. This structure is attributed to a periodic ordering of oxygen vacancies compared to the fluorite structure of CeO2. © 2013 American Institute of Physics.

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Wilkens, H., Schuckmann, O., Oelke, R., Gevers, S., Schaefer, A., Bäumer, M., … Wollschläger, J. (2013). Stabilization of the ceria ι-phase (Ce7O12) surface on Si(111). Applied Physics Letters, 102(11). https://doi.org/10.1063/1.4795867

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