Pattern generation by using multi-step room-temperature nanoimprint lithography

Abstract

We have demonstrated multi-step room-temperature nanoimprint lithography (RTNIL) using polystyrene (PS, average molecular weight 97 kg/mol) as the imprint polymer layer on a silicon substrate for imprinting complex patterns. Single, double, and multiple (up to 10) sequential imprint steps were performed at imprint pressures between 1 to 30 MPa in separate experiments. We also transferred the imprinted patterns from the PS layer into the silicon substrate by means of an reactive-ion etching (RIE) process. To accomplish this demonstration, we designed and built a tool that controllably and repeatedly translated and pressed a sample into a stationary mold. The demonstrated inter-step alignment accuracy of this tool ranged between 80 nm and 380 nm. These experiments revealed that polymer deformation results when nanoimprint is used to further deform a previously structured surface. The molds used in these experiments consisted of 400-nm-period diffraction gratings, as well as of rectangular structures of varying aspect ratios, ranging from 150 to 300 nm wide. Copyright © 2007 IEEE.