Fabrication of low-density GaN/AlN quantum dots via GaN thermal decomposition in MOCVD

8Citations
Citations of this article
16Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

With an appropriate high anneal temperature under H2 atmosphere, GaN quantum dots (QDs) have been fabricated via GaN thermal decomposition in metal organic chemical vapor deposition (MOCVD). Based on the characterization of atomic force microscopy (AFM), the obtained GaN QDs show good size distribution and have a low density of 2.4 × 108 cm-2. X-ray photoelectron spectroscopy (XPS) analysis demonstrates that the GaN QDs were formed without Ga droplets by thermal decomposition of GaN. © 2014 Zhang et al.; licensee Springer.

Cite

CITATION STYLE

APA

Zhang, J., Li, S., Xiong, H., Tian, W., Li, Y., Fang, Y., … Chen, C. (2014). Fabrication of low-density GaN/AlN quantum dots via GaN thermal decomposition in MOCVD. Nanoscale Research Letters, 9(1), 1–5. https://doi.org/10.1186/1556-276X-9-341

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free