Characterization of two by two electron-beam microcolumn array aligned with field emission array

Abstract

A two by two electron microcolumn array aligned with field emission array (FEA) was fabricated based on our electron-beam simulation. The spherical and chromatic aberrations, that affect the spot size of the e-beam, are highly dependent on the alignment of the electrostatic microlenses. A laser micromachining technique was used for making a self-aligned microcolumn. A FEA with a designed size and spacing was aligned and bonded to the microcolumn. The I–V and current stabilities of the microcolumn were measured and the field emission pattern of highly focused e-beam was obtained. The application of focused electron beam or ion beam for lithography and miniaturized scanning electron microscopy are suggested.