“Electronic growth” of metallic overlayers on semiconductor substrates

385Citations
Citations of this article
111Readers
Mendeley users who have this article in their library.
Get full text

Abstract

We present a novel “electronic growth” model for metallic thin films on semiconductor substrates. Depending on the competition between the effects of quantum confinement, charge spilling, and interface-induced Friedel oscillations, different types of film stability are defined, as characterized by the existence of critical/magic thicknesses for smooth growth. In particular, smooth growth can be achieved only above a few monolayers for noble metals, and only for the first layer for alkali metals. © 1998 American Physical Society.

Cite

CITATION STYLE

APA

Zhang, Z., Niu, Q., & Shih, C. K. (1998). “Electronic growth” of metallic overlayers on semiconductor substrates. Physical Review Letters, 80(24), 5381–5384. https://doi.org/10.1103/PhysRevLett.80.5381

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free