Abstract
The room-temperature longitudinal piezoresistance of n-type and p-type crystalline silicon along selected crystal axes is investigated under uniaxial compressive stresses up to 3 GPa. While the conductance (G) of n-type silicon eventually saturates at 45% of its zero-stress value (G 0) in accordance with the charge transfer model, in p-type material G/G 0 increases above a predicted limit of 4.5 without any significant saturation, even at 3 GPa. Calculation of G/G 0 using ab initio density functional theory reveals that neither G nor the mobility, when properly averaged over the hole distribution, saturate at stresses lower than 3 GPa. The lack of saturation has important consequences for strained-silicon technologies. © 2012 American Physical Society.
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CITATION STYLE
Milne, J. S., Favorskiy, I., Rowe, A. C. H., Arscott, S., & Renner, C. (2012). Piezoresistance in silicon at uniaxial compressive stresses up to 3 GPa. Physical Review Letters, 108(25). https://doi.org/10.1103/PhysRevLett.108.256801
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