Evaluating the eye fatigue problem in wafer inspection

Abstract

After develop inspection (ADI) and after etching inspection (AEI) are the main inspection tasks in the wafer manufacturing fab. Because of the detailed and tiny circuit patterns, ADI and AEI are carried out with the aid of a microscope. ADI and AEI inspectors frequently complain about visual fatigue problems. In this study, we focused on evaluating the effects of display mode, search pattern, and inspection strategy on visual fatigue and inspection performance. A field study experiment was conducted. The results indicated that the display mode had significant influence on visual fatigue. Using a liquid crystal display (LCD) to inspect wafer defects can reduce the visual strain and body discomfort feelings. The change in inspection strategy had a positive effect on eye fatigue and inspection performance.