Abstract
Pulsed-laser irradiation followed by rapid thermal annealing was used to induce layer disordering of an InGaAs/InGaAsP laser structure. A band gap shift larger than 160 nm was achieved using energy densities of about 3.9 mJ mm-2 with 4800 pulses of laser irradiation. Transmission electron microscopy and photoluminescence were used to understand the possible effect of the laser irradiation on the material structure. Band gap-tuned lasers exhibiting blueshift up to 82 nm were obtained. This approach offers the prospect of a powerful and relatively simple postgrowth process for integrating multiple-wavelength lasers for wavelength-division-multiplexing applications. © 2001 American Institute of Physics.
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CITATION STYLE
Ong, T. K., Chan, Y. C., Lam, Y. L., & Ooi, B. S. (2001). Wavelength tuning in InGaAs/InGaAsP quantum well lasers using pulsed-photoabsorption-induced disordering. Applied Physics Letters, 78(18), 2637–2639. https://doi.org/10.1063/1.1362329
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