Structure and properties of two Al-Cr-Nb-Si-Ti high-entropy nitride coatings

Abstract

Two high-entropy alloy nitride films, (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)N50 and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)N50, were designed and prepared by reactive magnetron sputtering. The influences of substrate bias (from -50V to -150V) on chemical composition, microstructure, and mechanical properties of the deposited films were investigated. All the films have face-centered cubic NaCl-type structure. The (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx films deposited at -100V exhibit the highest hardness of 36.1GPa, and the (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have its maximum hardness of 36.7GPa at a substrate bias of -150V. Both (Al23.1Cr30.8Nb7.7Si7.7Ti30.7)Nx and (Al29.1Cr30.8Nb11.2Si7.7Ti21.2)Nx films have outstanding oxidation resistance at 900°C. © 2013 Elsevier B.V.