Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects

Shiu, L.-H., Liang, F.-J., Chang, H., Chen, C.-K., Chen, L.-J., Gau, T.-S., & Lin, B. J. (2007). Immersion defect reduction, part II: the formation mechanism and reduction of patterned defects. In Optical Microlithography XX (Vol. 6520, p. 652012). SPIE. https://doi.org/10.1117/12.712527