Abstract
We have grown epitaxial WO3 films on various single-crystal substrates using radio frequency magnetron sputtering. While pronounced surface roughness is observed in films grown on LaSrAlO4 substrates, films grown on Y AlO3 substrates show atomically flat surfaces, as demonstrated by atomic force microscopy and X-ray diffraction (XRD) measurements. The crystalline structure has been confirmed to be monoclinic by symmetric and skew-symmetric XRD. The dependence of the growth modes and the surface morphology on the lattice mismatch are discussed.
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CITATION STYLE
Leng, X., Pereiro, J., Strle, J., Bollinger, A. T., & Božović, I. (2015). Epitaxial growth of high quality WO3 thin films. APL Materials, 3(9). https://doi.org/10.1063/1.4930214
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