Abstract
Corrosion of the metallization used for interconnecting the various circuit elements on a microelectronic device continues to to cause concern regarding reliability despite the fact over 500 papers have been published on this subject representing 30 years of effort by industry. Controversy still remains in a number of technologically important areas, including the functional form and fitting parameters of the acceleration functions. In this paper we briefly summarize the current understanding of corrosion-induced degradation and its effect on the reliability of microelectronic circuits.
Cite
CITATION STYLE
Osenbach, J. W. (1996, February). Corrosion-induced degradation of microelectronic devices. Semiconductor Science and Technology. https://doi.org/10.1088/0268-1242/11/2/002
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