Resistivity and magnetism of Co/Cu films produced by computer controlled pulse electrodeposition

Abstract

A pulse electrodeposition technique using a pulse generator circuit has been utilized to produce multilayer films with control on an atomic scale. The pulse generator was designed to control the deposition time within the range of 0.1 ms. The magnetoresistance ratio for the multilayer film controlled on an atomic scale had a maximum value of about 9.5% at the stacking number of 110. The temperature dependence of magnetization for the films with thin layers shows superparamagnetic behavior.