2.07-kV AlGaN/GaN Schottky Barrier Diodes on Silicon with High Baliga's Figure-of-Merit

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Abstract

In this letter, we demonstrate high-performance AlGaN/GaN Schottky barrier diodes (SBDs) on Si substrate with a recessed-anode structure for reduced turn-on voltage VON. The impact of the surface roughness after the recessed-anode formation on device characteristics is investigated. An improved surface condition can reduce the leakage current and enhance the breakdown voltage simultaneously. A low turn-on voltage of only 0.73 V can be obtained with a 50-nm recess depth. In addition, the different lengths of Schottky extension acting like a field plate are investigated. A high reverse breakdown voltage of 2070 V and a low specific ON-resistance of 3.8 mΩ cm2 yield an excellent Baliga's figure of merit of 1127 MW/cm2, which can be attributed to the low surface roughness of only 0.6 nm and also a proper Schottky extension of 2 μm to alleviate the peak electric field intensity in the SBDs.

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Tsou, C. W., Wei, K. P., Lian, Y. W., & Hsu, S. S. H. (2016). 2.07-kV AlGaN/GaN Schottky Barrier Diodes on Silicon with High Baliga’s Figure-of-Merit. IEEE Electron Device Letters, 37(1), 70–73. https://doi.org/10.1109/LED.2015.2499267

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