Abstract
The exciton recombination processes in a series of elastically strained GaAsBi epilayers are investigated by means of time-integrated and time-resolved photoluminescence at T = 10 K. The bismuth content in the samples was adjusted from 1.16% to 3.83%, as confirmed by high-resolution X-ray diffraction (HR-XRD). The results are well interpreted by carrier trapping and recombination mechanisms involving the Bi-related localized levels. Clear distinction between the localized and delocalized regime was observed in the spectral and temporal photoluminescence emission. © 2014 Mazzucato et al.
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Mazzucato, S., Lehec, H., Carrère, H., Makhloufi, H., Arnoult, A., Fontaine, C., … Marie, X. (2014). Low-temperature photoluminescence study of exciton recombination in bulk gaasbi. Nanoscale Research Letters, 9(1). https://doi.org/10.1186/1556-276X-9-19
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