Structural analysis of AIN and (Ti1-XAlX)N coatings made by plasma enhanced chemical vapor deposition

Abstract

(Ti1-XAlX)N coatings were deposited by plasma enhanced chemical vapor deposition (PECVD) method using a gas mixture of TiCl4, AlCl3, NH3, H2 and Ar. X-ray diffraction and transmission electron microscopy were used to investigate the structure of the deposited (Ti1-XAlX)N coatings. They showed single phase NaCl-structure up to X=0.8, while a mixed phase of NaCl type (Ti0.2Al0.8)N and AlN with würtzite-structure was observed for 0.8