Abstract
In segregation effects during InAs growth on GaAs(001) and critical thickness for InAs self-assembled quantum dots are studied using a real time, in situ technique capable of measuring accumulated stress during growth. Due to a large (∼ 50%) surface In segregation of floating In, self-assembled dot formation takes place when less than one monolayer of InAs is pseudomorphically grown on GaAs. A picture of the growth process is discussed on the basis of the equilibrium between InAs and floating In dominated by the stress energy. © 2000 American Institute of Physics.
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CITATION STYLE
García, J. M., Silveira, J. P., & Briones, F. (2000). Strain relaxation and segregation effects during self-assembled InAs quantum dots formation on GaAs(001). Applied Physics Letters, 77(3), 409–411. https://doi.org/10.1063/1.126992
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