Removal of sulfamethoxazole, sulfathiazole and sulfamethazine in their mixed solution by UV/H2O2 process

Abstract

Sulfamethoxazole (SMZ), sulfathiazole (STZ) and sulfamethazine (SMT) are typical sulfonamides, which are widespread in aqueous environments and have aroused great concern in recent years. In this study, the photochemical oxidation of SMZ, STZ and SMT in their mixed solution using UV/H2 O2 process was innovatively investigated. The result showed that the sulfonamides could be completely decomposed in the UV/H2 O2 system, and each contaminant in the co-existence system fitted the pseudo-first-order kinetic model. The removal of sulfonamides was influenced by the initial concentration of the mixed solution, the intensity of UV light irradiation, the dosage of H2 O2 and the initial pH of the solution. The increase of UV light intensity and H2 O2 dosage substantially enhanced the decomposition efficiency, while a higher initial concentration of mixed solution heavily suppressed the decomposition rate. The decomposition of SMZ and SMT during the UV/H2 O2 process was favorable under neutral and acidic conditions. Moreover, the generated intermediates of SMZ, STZ and SMT during the UV/H2 O2 process were identified in depth, and a corresponding degradation pathway was proposed.