Abstract
Electrophoretic deposition (EPD) was used to deposit dielectric thin films. A fine Ba0.9Sr0.1TiO3 powder slurry was suspended in acetone and iodine was added to enhance the film quality by increasing the zeta potential. The highest zeta potential was obtained by adding 0.10 g/L of I2, which allowed a 0.54-μm-thick film to be deposited on a Ni foil in 10 s at 20V. After annealing the film at 800°C for 30min in a N2 atmosphere, the capacitance density of the film was 73.9 nF/cm2 and its loss tangent was 0.021, while the residual leakage current density at 10V was as low as 0.3μA/cm2. No frequency dependence was observed in the range 1 kHz to 10 MHz. © 2010 The Ceramic Society of Japan. All rights reserved.
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Abe, N., Hoshino, M., Kitamura, N., Ichiryu, A., & Idemoto, Y. (2010). Preparation and estimation of Ba0.9Sr0.1TiO 3 dielectric films by EPD method with fine powder slurry. Journal of the Ceramic Society of Japan, 118(1377), 374–379. https://doi.org/10.2109/jcersj2.118.374
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