Effects of Added Chloride Ion on Electrodeposition of Copper from a Simulated Acidic Sulfate Bath Containing Cobalt Ions

Abstract

The effects of added chloride ion on copper electrodeposition was studied using Pb-Sb anode and a stainless steel cathode in an acidic sulfate bath containing added Co 2+ ion. The presence of added chloride ion in the electrolyte solution containing 150 ppm of Co 2+ ion was found to increase the anode and the cell potentials and decrease the cathode potential. Linear sweep voltammetry (LSV) was used to study the effects of added chloride ion on the anodic process during the electrodeposition of copper in the presence of added ppm; the oxygen evolution potential is polarised by adding 10 ppm chloride ion at current densities (≥150 A/m 2 ), and further increase in chloride ion concentration increases the polarisation of oxygen evolution reaction more at higher current densities. X-ray diffraction (XRD) showed that added chloride ion and added Co 2+ ion changed the preferred crystal orientations of the copper deposits differently. Scanning electron microscopy (SEM) indicated that the surface morphology of the copper deposited in the presence of added chloride ion and added Co 2+ ion has well-defined grains.