Measurement of phonon-exciton dephasing rate in GaN on sapphire by degenerate four-wave mixing

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Abstract

The density and temperature dependence of the exciton dephasing time of two hexagonal GaN films on sapphire is measured using degenerate four-wave mixing (DFWM). The residual 4 ps dephasing time at low temperature and density is caused by exciton-impurity scattering. We present a theory of DFWM for various amount of inhomogeneous broadening. Good agreement of the temperature dependence of the dephasing time is found between theory and experiment. © 1998 American Institute of Physics.

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Pau, S., Kuhl, J., Scholz, F., Haerle, V., Khan, M. A., & Sun, C. J. (1998). Measurement of phonon-exciton dephasing rate in GaN on sapphire by degenerate four-wave mixing. Applied Physics Letters, 72(5), 557–559. https://doi.org/10.1063/1.120757

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