Modular deposition chamber for in situ X-ray experiments during RF and DC magnetron sputtering

Abstract

A new sputtering system for in situ X-ray experiments during DC and RF magnetron sputtering is described. The outstanding features of the system are the modular design of the vacuum chamber, the adjustable deposition angle, the option for plasma diagnostics, and the UHV sample transfer in order to access complementary surface analysis methods. First in situ diffraction and reflectivity measurements during RF and DC deposition of vanadium carbide demonstrate the performance of the set-up. © 2012 International Union of Crystallography Printed in Singapore - All rights reserved.