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Adaptive modeling of the femtosecond inscription in silica

  • Mezentsev V
  • Petrovic J
  • Dreher J
  • et al.
Laser-based Micropackaging (2006) 6107 61070R
DOI: 10.1117/12.647303
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Abstract

We present an adaptive mesh approach to high performance comprehensive investigation of dynamics of light and plasma pattens during the process of direct laser inscription. The results reveal extreme variations of spatial and temporal scales and tremendous complexity of these patterns which was not feasible to study previously.

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Mezentsev, V., Petrovic, J., Dreher, J., & Grauer, R. (2006). Adaptive modeling of the femtosecond inscription in silica. In Laser-based Micropackaging (Vol. 6107, p. 61070R). SPIE. https://doi.org/10.1117/12.647303

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