Abstract
(Figure Presented) Quick as a flash: High-speed scanning probe lithography in perfluorooctane leads to direct deposition of fluorinated amorphous carbon at velocities in the cm s-1 range. Features as small as 27 nm are fabricated on 100-μm2 areas within seconds. The nanoscale patterns are characterized by using photoelectron emission microscopy and secondary ion mass spectrometry. © 2007 Wiley-VCH Verlag GmbH & Co. KGaA.
Author supplied keywords
Cite
CITATION STYLE
APA
Rolandi, M., Suez, I., Scholl, A., & Fréchet, J. M. J. (2007). Fluorocarbon resist for high-speed scanning probe lithography. Angewandte Chemie - International Edition, 46(39), 7477–7480. https://doi.org/10.1002/anie.200701496
Register to see more suggestions
Mendeley helps you to discover research relevant for your work.
Already have an account? Sign in
Sign up for free