X-ray laue diffraction microscopy in 3D at the advanced photon source

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Abstract

Studies of materials on mesoscopic length-scales require a penetrating structural probe with submicron point-to-point spatial resolution. The principle research activities at beamline 34-ID-E of the Advanced Photon Source (APS) involve development of exciting new micro-/nano-diffraction techniques for characterization and microscopy in support of both applied engineering and fundamental materials research. Taking advantage of the high brightness of the source, advanced focusing mirrors, a novel depth profiling technique, and high-speed area detectors, three-dimensional scanning Laue diffraction microscopy provides detailed local structural information of crystalline materials, such as crystallographic orientation, orientation gradients, and strain tensors. It is general and applicable to single-crystal, polycrystalline, composite, deformed, and functionally graded materials. Applications include 3D diffraction investigations for a diverse and growing user community with interests in materials deformation, electro-migration, recrystallization, fatigue, solid-solution precipitation, high-pressure environments, and condensed matter physics. © 2011 American Institute of Physics.

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Liu, W., Zschack, P., Tischler, J., Ice, G., & Larson, B. (2010). X-ray laue diffraction microscopy in 3D at the advanced photon source. In AIP Conference Proceedings (Vol. 1365, pp. 108–111). https://doi.org/10.1063/1.3625316

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