The technology of plasma spray physical vapour deposition

29Citations
Citations of this article
27Readers
Mendeley users who have this article in their library.

Abstract

The article presents a new technology of thermal barrier coating deposition called Plasma Spray - Physical Vapour Deposition (PS-PVD). The key feature of the process is the option of evaporating ceramic powder, which enables the deposition of a columnar ceramic coating. The essential properties of the PS-PVD process have been outlined, as well as recent literature references. In addition, the influence of a set of process conditions on the properties of the deposited coatings has been described. The new plasma-spraying PS-PVD method is a promising technology for the deposition of modern thermal barrier coatings on aircraft engine turbine blades.

Cite

CITATION STYLE

APA

Goral, M., Kotowski, S., & Sieniawski, J. (2013). The technology of plasma spray physical vapour deposition. High Temperature Materials and Processes, 32(1), 33–39. https://doi.org/10.1515/htmp-2012-0051

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free