Abstract
We have developed an extreme ultraviolet ({EUV}) scatterometer based on the analysis of coherent {EUV} light diffracted from a periodic array with nano-scale features. We discuss the choice of appropriate orders of the high harmonics generated coaxially along with the intense Ti:sapphire laser pulses for high resolution spatial performance. We describe an inverse-problem methodology for determining the structural parameters, and present preliminary measurement results confirming the functionality of the scatterometer. A rigorous coupled-wave analysis measurement algorithm was developed to extract accurately and quickly the relevant constitutive parameters from a measured diffraction pattern using a library-matching process.
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CITATION STYLE
Ku, Y.-S., Yeh, C.-L., Chen, Y.-C., Lo, C.-W., Wang, W.-T., & Chen, M.-C. (2016). EUV scatterometer with a high-harmonic-generation EUV source. Optics Express, 24(24), 28014. https://doi.org/10.1364/oe.24.028014
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