Graphene schottky junction on pillar patterned silicon substrate

27Citations
Citations of this article
22Readers
Mendeley users who have this article in their library.

Abstract

A graphene/silicon junction with rectifying behaviour and remarkable photo-response was fabricated by transferring a graphene monolayer on a pillar-patterned Si substrate. The device forms a 0.11 eV Schottky barrier with 2.6 ideality factor at room temperature and exhibits strongly biasand temperature-dependent reverse current. Below room temperature, the reverse current grows exponentially with the applied voltage because the pillar-enhanced electric field lowers the Schottky barrier. Conversely, at higher temperatures, the charge carrier thermal generation is dominant and the reverse current becomes weakly bias-dependent. A quasi-saturated reverse current is similarly observed at room temperature when the charge carriers are photogenerated under light exposure. The device shows photovoltaic effect with 0.7% power conversion efficiency and achieves 88 A/W photoresponsivity when used as photodetector.

Cite

CITATION STYLE

APA

Luongo, G., Grillo, A., Giubileo, F., Iemmo, L., Lukosius, M., Chavarin, C. A., … Di Bartolomeo, A. (2019). Graphene schottky junction on pillar patterned silicon substrate. Nanomaterials, 9(5). https://doi.org/10.3390/nano9050659

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free