Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study

Seah, M. P., Spencer, S. J., Bensebaa, F., Vickridge, I., Danzebrink, H., Krumrey, M., … Dura, J. A. (2004). Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study. Surface and Interface Analysis, 36(9), 1269–1303. https://doi.org/10.1002/sia.1909