Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations

  • Shih A
  • Flinton R
  • Vaidyanathan J
  • et al.
N/ACitations
Citations of this article
20Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

This study examined the effect of four margin designs on marginal adaptation of Captek crowns during selected processing steps. Twenty-four Captek crowns were fabricated, six each of four margin designs: shoulder (Group A), chamfer (Group B), chamfer with bevel (Group C), and shoulder with bevel (Group D). Marginal discrepancies between crowns and matching dies were measured at selected points for each sample at the coping stage (Stage 1), following porcelain application (Stage 2) and cementation (Stage 3). Digital imaging methods were used to measure marginal gap. The results indicate decreasing trend of margin gap as a function of margin design in the order A>B>C>D. Between processing steps, the trend was in the order Stage 3 < Stage 1 < Stage 2. Porcelain firing had no significant effect on marginal adaptation, but cementation decreased the marginal gap. Generally, the margin gap in Captek restorations were in all cases less than the reported acceptable range of margin gaps for ceramometal restorations. These results are clinically favorable outcomes and may be associated with the ductility and burnishability of matrix phase in Captek metal coping margins.

Cite

CITATION STYLE

APA

Shih, A., Flinton, R., Vaidyanathan, J., & Vaidyanathan, T. (2011). Effect of Margin Design and Processing Steps on Marginal Adaptation of Captek Restorations. ISRN Dentistry, 2011, 1–7. https://doi.org/10.5402/2011/810565

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free