Study on PQ/PMMA Photopolymer Films Fabricated by Solvent Casting

Abstract

PQ/PMMA photopolymer films fabricated by solvent casting are realized using tetrahydrofuran (THF) as the solvent. The corresponding photochemical reaction model is established with material parameters numerically studied based on 57 samples recorded with a 532 nm laser. The fabrication and the recording time are noticeably reduced. A 2-fold increase in the average refractive index variation is achieved compared with the two-step thermal polymerization method with the same PQ initial concentration.