Investigating the ArF laser stability of CaF 2 at elevated fluences

  • Burkert A
  • Muehlig C
  • Triebel W
  • et al.
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Abstract

Combined measurements of transmission T, absorption A and total scattering TS revealed the high accuracy of all applied measurement techniques by obtaining a sum T+A+TS+R = (100±0.3)% (R denotes the Fresnel reflection). In order to investigate CaF2 at high fluences, a variety of samples from high purity excimer grade to research grade was irradiated (80 ... 150 mJ/cm2, 2*10^6...7*10^6 pulses) and characterized before and after irradiation.

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Burkert, A., Muehlig, Ch., Triebel, W., Keutel, D., Natura, U., Parthier, L., … Duparre, A. (2005). Investigating the ArF laser stability of CaF 2 at elevated fluences. In Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies II (Vol. 5878, p. 58780E). SPIE. https://doi.org/10.1117/12.616904

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