Atomically flat palladium films grown on synthetic mica

Abstract

Atomically flat palladium thin films were heteroepitaxially formed on thermally stable synthetic fluorophlogopite mica [KMg3(AlSi3O10)F2]. Depositing palladium films was performed by a simple deposition method using home-made palladium filament without oxygen plasma. Combination of X-ray diffraction and atomic force microscopy revealed that thermally stable synthetic fluorophlogopite mica allowed post annealing at 800 C, resulting in formation of atomically flat twin single crystalline epitaxial Pd(111) films.