Evaluation of Ultraviolet Light-Based Oxidative Systems for the Inactivation and Change in Susceptibility of a Fluconazole-Resistant Candida albicans Strain

Abstract

Candida albicans, listed by WHO as a priority fungal (yeast) pathogen, can cause invasive infections resistant to drugs, thus demanding novel strategies of disinfection. This study examines the inactivation, reactivation in darkness, and susceptibility to fluconazole of an antifungal-resistant C. albicans strain through UVC photolysis, chemical oxidation, and photooxidation using hydrogen peroxide (H2O2), peroxydisulfate (PDS), or peroxymonosulfate (PMS). Tests were performed in deionized water over very short treatment times (0–80 s). Also, standardized CLSI methods for antifungal sensitivity studies and morphological microscopic views were carried out. The fungus disinfection order was UVC/H2O2 > UVC/PDS > UVC/PMS > UVC. The photooxidation processes followed pseudo-first-order kinetics, with the highest rate constant for the UVC/H2O2 process. Direct oxidation, photoinactivation, and attacks of radical species were responsible for the inactivation of the antifungal-resistant microorganism. The fluconazole susceptibility of yeasts was significantly decreased (from 64 to 8 µg mL−1) by the action of UVC/H2O2. A low reactivation in the dark and strong changes in the yeast morphology were found, indicating that the use of UVC light and radical-based processes is an effective alternative for fluconazole-resistant yeasts and could be promising to deal with hospital wastewater loaded with resistant fungi.